Korvus HEX - Modular PVD system
Main features:
- Sputtering, E-beam Evaporating, Thermal Evaporating Compatible
- Modular design, changeable after installation
- Education and training
- Glovebox compatible
Main configuration and performance:
1. Detachable chamber wall(functional, blank, Process gas line)
2. Small footprint ~ 1m2 Size:65cm*60cm*70cm, weight: 50kg
3. Pumping speed (5*10-6 Torr within 20 mins)
4. 4 inch substrate (rotation: 2-20rpm, Heating: 500℃, Water cooling, DC bias options)
5. Multiple depsition technics: Sputter, E-beam, Thermal, Organic evaporation
6. QCM, Glavebox and customized options.
7. Automation control
8. Load-lock option
9. In-situ monitoring option
Model:
HEX
HEX-L
80 l/s
3(plus QCM)
Max Substrate size
4 inch
6 inch
Turbo Pump
300 l/s
Pump upgrade
300 l/s
700 l/s
Number of side panel
6
6
Number of deposition source
6
Compatible technology
Sputter, Thermal, E-beam
Sputter, Thermal, E-beam
Application:
Chemical Catalysis
Metal Electrode film
Magnetic film
Semiconductor film
Super thin film
Optical film
Contact: Nana Zhang
Phone: 18201230727
Tel: 010-80698356
Email: Info@be-instruments.com
Add: Room 1310, AirChina Plaza, No. 36 Xiaoyun Road, Chaoyang District, Beijing