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EUV turnkey system

  • EUV mask and mask blank reflectometer
EUV mask and mask blank reflectometer

EUV mask and mask blank reflectometer

  • wavelength range: 12.5~14.5 nm
  • Product description: EUV mask and mask blank reflectometer
  • INQUIRY

Research Instruments GmbH (RI) is a majority owned subsidiary of Bruker Energy & Supercon Technologies Inc., a subsidiary of Bruker Corporation and was established in 2009. RI has long experience in building and working with Advanced Technologies (UH Vacuum, Ultra-clean, Nano-positioning in Vacuum, EUV sources, optics, and integration Discharges, Analytics, Spectroscopy).

RI's competence in soft-x-ray, XUV & EUV lab solutions is on plasma based radiation sources integrated in systems with ultra-high and ultra-clean vacuum and optical and fine mechanical components.

EUV mask and mask blank reflectometer

Specifications:

wavelength range 12.5 ~ 14.5 nm
Spot size < 250 x 100 micron
Time to measure within 30 seconds
Spectral resolution 1.7 pm
Accuracy < 3 pm

CONTACT US

Contact: Nana Zhang

Phone: 18201230727

Tel: 010-80698356

Email: Info@be-instruments.com

Add: Room 1310, AirChina Plaza, No. 36 Xiaoyun Road, Chaoyang District, Beijing