Introduction to Magnetron Sputtering

Magnetron sputtering is a type of physical vapor deposition (Physical Vapor Deposition, PVD).

principle

Under the action of the electric field, the electrons accelerate towards the substrate and collide with argon atoms, ionizing a large number of argon ions and electrons, and the electrons fly towards the substrate. Argon ions accelerate and bombard the target under the action of the electric field, sputtering out a large number of target atoms, and neutral target atoms (or molecules) are deposited on the substrate to form a film.

Features

1. High deposition rate

2. High power efficiency

3. Low sputtering energy

4. Low substrate temperature

5. Achieve large-area film formation

application

Magnetron sputtering is currently a widely used thin film deposition technology. The continuous development of sputtering technology and the exploration and research of new functional films have extended the application of magnetron sputtering to many production and scientific research fields.

1. As a non-thermal coating technology in the field of microelectronics, it is mainly used in the deposition of material thin films that are difficult and unsuitable for chemical vapor deposition (CVD) or metal organic chemical vapor deposition (MOCVD), and can achieve very uniform coating over a large area. of film. Including ohmic contact Al, Cu, Au, W, Ti and other metal electrode films and TiN, Ta2O5, TiO, Al2O3, ZrO2, AlN and other dielectric film deposition that can be used for gate insulating layers or diffusion barrier layers.

2. Magnetron sputtering technology is also used in optical films (such as anti-reflection coating), low-e glass and transparent conductive glass. SiO2 films and doped ZnO or InSn oxide (ITO) films are prepared by sputtering on transparent conductive glass on a glass substrate or flexible substrate, so that the average light transmittance in the visible light range is above 90%.

3. In the modern mechanical processing industry, magnetron sputtering technology is used to produce surface functional films, superhard films, and self-lubricating films, which can effectively improve surface hardness, composite toughness, wear resistance, and high-temperature chemical stability, thus Significantly improve the service life of coating products. In addition to the above-mentioned fields where it has been widely used, magnetron sputtering also plays an important role in the research of high-temperature superconducting films, ferroelectric films, giant magnetoresistive films, thin film luminescent materials, solar cells, and memory alloy films.