The OCTOPLUS 400 molecular beam epitaxial system is a general-purpose MBE system that is highly suitable for III/V, II/VI, and other composite semiconductor material applications. Compatible with 2-4-inch standard chips. Vertical split cavity design can be used to assemble various source furnaces and achieve molecular beam epitaxial growth of different materials.
System features:
● Universal MBE system for research and development
Applied to epitaxial growth of III/V and II/VI materials
Applicable to 2-4 inch samples
8 standard CF flange holes (can be expanded to 10 according to requirements)
● Can be upgraded and optionally equipped to achieve system expansion
● In situ growth characterization
Easy to use and maintain
We can provide different types of evaporation sources according to the requirements of all customers, including K-cell, electron beam evaporation sources, thermal cracking sources, valve cracking sources, gas cracking sources, etc. Quartz crystal oscillators, reflective high-energy electron diffraction (RHEED), or quadrupole mass spectrometers can be used to achieve in-situ monitoring of sample growth. EpiSoft MBE software can accurately control the temperature of all baffles, evaporation sources, and sample stage heaters. Maximizing the repeatability of operations.
The main characteristics of Octopus 400 are high reliability and universality, as well as its small footprint. These characteristics make our system very suitable for research and development.
The standard Octopus 400 has 8 4.5 '' (CF63) flange ports, which can be expanded to 10 flange ports according to requirements. The loading chamber is equipped with a high-precision magnetic transfer sample rod, which allows for rapid sample transfer without damaging the vacuum of the MBE chamber.
