Spin type target platform
The spin type target ensures the uniformity of etching by the rotation of the target material. Rotation is controlled by a DC motor through a rotary feeder.
According to different needs, several target materials can be selected to rotate independently or simultaneously.
It is possible to automatically select targets through a stepper motor to achieve automated growth of multilayer films.
Scanning target platform
In a scanning target platform, the target material can be scanned in both horizontal and vertical directions, allowing the laser to relatively scan the surface of the target material. However, the position and angle of the feather light do not change relative to the substrate, ensuring the stability of deposition.
When conducting multiple continuous deposition experiments, different areas of the target material can be selected for scanning. Therefore, the target material can be used for a long time without the need to polish the surface of the target material after each deposition, minimizing the loss of the target material.
Compared to spin type targets, scanning type targets can adjust the scanning range according to different target materials and can be used for irregularly shaped targets.
Scanning and target selection are both automatically controlled by computers and can be used for multi-layer film automated growth experiments.
