Twente Solid State Technology BV (TSST) in the Netherlands focuses on providing cust omized pulse laser deposition systems (PLDs) and related thin film preparation solutions for users. The company has over 20 years of experience in researching and producing pulse laser deposition systems.
TSST maintains close cooperation with the MESA+Institute at Twente University in the Netherlands, one of the world's largest research centers for nano and microsystem technology, to develop core technologies required for various pulse laser deposition technologies.
The principle of pulse laser deposition: In a vacuum environment, a pulse laser is used to bombard the surface of the target material, and the local heat generated by the laser is used to bombard the target material out, which is then deposited on different substrates to form a thin film.
PLD working principle diagram
Laser molecular beam epitaxy (LMBE) is an epitaxial thin film growth technology developed on the basis of PLD.
Implementing RHEED in-situ monitoring in high oxygen pressure environments was once an important challenge in RHEED analysis. TSST was the first to propose differential pumping to achieve RHEED in-situ monitoring in high-pressure environments - TorrRHEED. TSST is the inventor of TorrRHEED and has extensive experience in system manufacturing, RHEED usage, and result analysis.
Standard Laser Molecular Beam Epitaxy System (LMBE)
Pulsed laser deposition technology is suitable for producing thin films including various polyoxides, nitrides, sulfide films, metal films, magnetic materials, etc.
Application field:
Single crystal thin film epitaxy (SrTiO3, LaAlO3)
Piezoelectric thin films (PZT, AlN, BiFeO3, BaTiO3)
Ferroelectric thin films (BaTiO3, KH2PO4)
Thermoelectric thin film (SrTiO3)
Metal and compound thin film electrodes (Ti, Ag, Au, Pt, Ni, Co, SrRuO3, LaNiO3, YZrO2, GdCeO2, LaSrCoFeO3)
Semiconductor thin films (Zn (Mg) O, AlN, SrTiO3)
High K dielectric thin films (HfO2, CeO2, Al2O3, BaTiO3, SrTiO3, PbZrTiO3, LaAlO3, Ta2O5)
Superconducting thin films (YBa2CuO7-x, BiSrCaCuO)
Optical waveguide, optical thin film (PZT, AlN, BaTiO3, Al2O3, ZrO2, TiO2)
Superhydrophobic thin film (PTFE)
Infrared detection thin film (V2O5, PZT)
Epitaxial thin film display
