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MBE Cluster Source

  • Dual Doping Source-DDS
  • Dual Doping Source-DDS
  • Dual Doping Source-DDS
  • Dual Doping Source-DDS
  • Dual Doping Source-DDS
  • Dual Doping Source-DDS
  • Dual Doping Source-DDS
Dual Doping Source-DDSDual Doping Source-DDSDual Doping Source-DDSDual Doping Source-DDSDual Doping Source-DDSDual Doping Source-DDSDual Doping Source-DDS

Dual Doping Source-DDS

  • Model: DDS
  • Individual Shutter
  • Precise flux control
  • Product description: Dual Doping Source-DDS
  • INQUIRY

Each MBE system is limited due to its number of source ports. The Dual Doping Sources DDS were developed to increase the available range of dopants in MBE systems. Dual Doping Sources introduce two individually operated dopant sources on a single fl ange.


Features:

Two doping cells separated by a water

cooled Ta-shielding

Individual cell shutters

Compatible with most MBE systems

Compact cell design with low power

consumption at high temperatures

Precise and reproducible temperature measurement

CONTACT US

Contact: Nana Zhang

Phone: 18201230727

Tel: 010-80698356

Email: Info@be-instruments.com

Add: Room 1310, AirChina Plaza, No. 36 Xiaoyun Road, Chaoyang District, Beijing